Dopants

Linde Nippon Sanso is the market leader for ion implantation doping gases:
Ion Implantation

Our offering of dopants in pressure cylinders or dopant mixtures includes:
Phosphine (PH₃)
Arsine (AsH₃)
Diborane (B₂H₆)
Trimethyl boron (TMB)
and others
(each pure or in customised mixtures)

Please refer to our product catalogue or:
Contact Linde Nippon Sanso

Productgroup		Product
Arsine		Arsine 5.0
Arsine in Hydrogen		15 % Arsine, Balance Hydrogen
Phosphine in Hydrogen		15 % Phosphine, Balance Hydrogen  20-100 ppm Phosphine, Balance Hydrogen
Phosphine		Phosphine 5.0
Phosphine in Nitrogen		0,4 ppm Phosphine, Balance Nitrogen