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Etching Gases & Solutions

Higher aspect ratios and shrinking device geometries place tight requirements on the etching procedures used in semiconductor manufacturing. The current and upcoming processes require advanced tailored etching molecules or more sophisticated gas combinations. Linde Nippon Sanso offers the complete range of etching and cleaning gases and related supply systems to the customers in the electronics industry.

Also, environmental aspects are becoming more important year by year. Together with our global partners we are constantly working to improve the efficiency of etching procedures, to develop new applications and to introduce new gases which are environmentally friendly.

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Product list Etching Gases

Productgroup Product
Boron trichloride   Boron trichloride 2.8
 Boron trichloride 4.0
 Boron trichloride 5.0
Boron trifluoride   Boron trifluoride 1.6
 Boron trifluoride 2.5
Chlordifluoromethane   Chlordifluoromethane 2.8 (R 22)
Chlorine   Chlorine 2.8
 Chlorine 4.0
 Chlorine 5.0
Difluoromethane   Difluoromethane 3.0 (R 32)
Fluoromethane   Fluoromethane 2.5 (R 41)
Hexafluorethane   Hexafluoroethane 2.8 (R 116)
 Hexafluoroethane 3.5 (R 116)
 Hexafluoroethane 5.0 (R 116)
Hydrogen bromide   Hydrogen bromide 2.8
 Hydrogen bromide 4.5
 Hydrogen bromide 5.0
Hydrogen chloride   Hydrogen chloride 2.8
 Hydrogen chloride 4.5
 Hydrogen chloride 5.0
 Hydrogen chloride 5.5
Nitrogen trifluoride   Nitrogen trifluoride 4.0
 Nitrogen trifluoride 4.5
Octafluorocyclobutane   Octafluorocyclobutane 4.8 (R C318)
Octafluoropropane   Octafluoropropane 3.5 (R 218)
Octafluorotetrahydrofurane   Octafluorotetrahydrofurane 2.5
Silicon tetrafluoride   Silicon tetrafluoride 4.8
Sulfur hexafluoride   Sulfur hexafluoride 3.0
 Sulfur hexafluoride 4.5
 Sulfur hexafluoride 4.8
 Sulfur hexafluoride 5.0
Tetrafluoromethane   Tetrafluoromethane 2.8 (R 14)
 Tetrafluoromethane 3.5 (R 14)
 Tetrafluoromethane 4.5 (R 14)
 Tetrafluoromethane 5.0 (R 14)
Trifluoromethane   Trifluoromethane 2.8 (R 23)
 Trifluoromethane 3.5 (R 23)
 Trifluoromethane 4.8 (R 23)
 Trifluoromethane 5.0 (R 23)
Xenon   Xenon 4.0
 Xenon 4.5
 Xenon 5.0
 Xenon 5.3 Halocarbon free





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 News

Linde Nippon Sanso moves headquarters to Munich
European Photovoltaic Conference Sept 03-06, 2007 in Milano - Visit Linde Nippon Sanso
Semicon Europa Oct. 09-11, 2007 in Stuttgart - Visit Linde Nippon Sanso
Grand Opening - 15 Sept. 2006: LNS & Linde inaugurate the most advanced electronic gases production facility in Europe






   

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