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Purification
R&D, high-k & low-k
Silicon Germanium (SiGe)
Wafer manufacturing

R&D, high-k & low-k

Linde Nippon Sanso is actively involved in state-of-the-art R&D.

We see ourselves as partners for the electronics industry. Our aim is to actively participate in the R&D efforts for future materials, processes and applications in close and long-term co-operations with our customers. Our R&D network comprises our shareholders Taiyo Nippon Sanso, Matheson Tri-Gas and The Linde Group. Its extends globally from Asia via Europe towards the United States.

Together with our customers we share and exchange research know-how and state-of the-art process developments on a worldwide basis. Our R&D activities are not limited to large industrial partners but also extend to more basic questions of fundamental research.

Linde Nippon Sanso's R&D activities include:
High-k materials and applications
Low-k materials and applications
Cleaning and etching processes and products
Environmentally friendly products
Gas supply, recovery and abatement systems
Purification technologies.


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