Cleaning Gases & Solutions

The requirements for efficient and fast chamber cleaning are constantly increasing. Linde Nippon Sanso offers the complete range of cleaning and etching gases and related supply solutions required for your tools and applications.

Also, environmental aspects are becoming more important every year. Together with our global partners we are constantly working to improve the efficiency of cleaning procedures, to develop new cleaning applications and to introduce new cleaning gases which are environmentally friendly.

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Productgroup		Product
Fluoromethane		Fluoromethane 2.5 (R 41)
Hexafluorethane		Hexafluoroethane 2.8 (R 116)  Hexafluoroethane 3.5 (R 116)  Hexafluoroethane 5.0 (R 116)
Nitrogen trifluoride		Nitrogen trifluoride 4.0  Nitrogen trifluoride 4.5
Octafluorocyclobutane		Octafluorocyclobutane 4.8 (R C318)
Octafluoropropane		Octafluoropropane 3.5 (R 218)
Octafluorotetrahydrofurane		Octafluorotetrahydrofurane 2.5
Sulfur hexafluoride		Sulfur hexafluoride 3.0  Sulfur hexafluoride 4.5  Sulfur hexafluoride 4.8  Sulfur hexafluoride 5.0
Tetrafluoromethane		Tetrafluoromethane 2.8 (R 14)  Tetrafluoromethane 3.5 (R 14)  Tetrafluoromethane 4.5 (R 14)  Tetrafluoromethane 5.0 (R 14)
Trifluoromethane		Trifluoromethane 2.8 (R 23)  Trifluoromethane 3.5 (R 23)  Trifluoromethane 4.8 (R 23)  Trifluoromethane 5.0 (R 23)