Hexafluoroethane 3.5 (R 116)
| Impurities Hexafluoroethane 3.5 (R 116), ppm: | | H2O |  | 5 | | O2 + N2 | | 300 | | other hal. HC | | 200 | | Acid | | 1* |
The percentages indicated in conjuction with purities are mole percents (ideal volume percentages) |
| Conversion factors Hexafluorethane |
m³ gas
(15 °C, 1 bar) | Litre
liquid at Ts | kg | | 1 | 3,625 | 5,829 | | 0,276 | 1 | 1,608 | | 0,172 | 0,622 | 1 |
| Identification Hexafluoroethane 3.5 (R 116) | | Cylinder shoulder color: | Bright Green RAL 6018 | | Label: | Hexafluoroethane 3.5
| Valve outlet:
| W 21.80 x 1/14, DIN 477 No. 6
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| Properties Hexafluorethane | Compressed gas, suffocating
|  | | MAK value: | nicht festgelegt | | Chemical symbol: | C2F6 | | Molar mass: | 138.01 g/mol | | Critical temperature: | 292.85 K (19.7 °C) | Boiling point
at 1,013 bar (Ts): | 194.95 K (-78.2 °C) | | Relative density at 15°C, 1 bar (dryair = 1): | 4.817 |
| Applications Hexafluoroethane 3.5 (R 116) | - dry etching of semiconductor materials and metals (e.g. plasma etching of SiO2, Si3N4, Ti)
- cleaning of CVD chambers
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Mixtures of Hexafluoroethane with other gases in defined compositions.
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