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Linde Nippon Sanso

Silicon Germanium (SiGe)

Ion Implantation

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Silicon Germanium (SiGe)

Wafer manufacturing

Dichlorosilane 2.0


	Purity, %	> 99


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Impurities Dichlorosilane 2.0, ppm:
other chlorosilane		1 %*
C		5 ppm*
Fe		50 ppb*
B		0,5 ppb*
P		0,5 ppb*
As		0,5 ppb*
The percentages indicated in conjuction with purities are mole percents (ideal volume percentages)

Delivery forms: Dichlorosilane 2.0
	Capacity, liter	Vapor pressure at 20°C, bar	filling quantity, kg
Steel cylinder	2	1,6	1,5
Steel cylinder	10	1,6	9
Steel cylinder	50	1,6	45
Delivery notes:	* mass fractions

Conversion factors Dichlorosilane

m³ gas (15 °C, 1 bar)	Litre liquid at T_s	kg
1	3,487	4,397
0,287	1	1,261
0,227	0,793	1

Identification Dichlorosilane 2.0
Cylinder shoulder color:	Yellow RAL 1018
Label:	Dichlorosilane 2.0
Valve outlet:	1 LH, DIN 477 No. 5

Properties Dichlorosilane
Under pressure liquified gas, highly flammable, caustic, toxic
MAK value:	5 ppm (TLV)
Chemical symbol:	SiH₂Cl₂
Molar mass:	101.01 g/mol
Critical temperature:	449.45 K (176.3 °C)
Boiling point at 1,013 bar (T_s):	281.55 K (8.4 °C)
Relative density at 15°C, 1 bar (dryair = 1):	3.630

Applications Dichlorosilane 2.0

Silicon deposition in CVD processes (e.g. epitaxy).

Other delivery forms Dichlorosilane
Dichlorosilane 3.0

Mixtures of Dichlorosilane with other gases in defined compositions.

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